Matsuoka Lab.
New Industry Creation Hatchery Center
Takashi Matsuoka
Emeritus Professor of Tohoku University

Facilities

Film Deposition/Growth Equipment for Ⅲ-Nitride

MOVPE sys. 1
Fig. 1-1. Metalorganic Vapor Phase Epitaxy Sys. 1
Model
Custom
Mrf.
TAKACHIHO TRADING CO.,LTD
Features
Heating
RF-Induction
TMax.
1,150°C
Reactor
Quratz
PMax.
113 kPa
MO feeding
APC and MFC with EPSON II
LL System
3 stage with RHEED
MOVPE sys. 2
Fig. 1-2. MOVPE Sys. 2
Model
GHT-2200/Custom
Maker
GII techno
Features
Heating
Resistance
TMax.
1,250°C
Reactor
Water Jacketed Stainless Steal
PGrowth
320 kPa
MO feeding
APC and MFC with Piezocon
In-situ
LayTec Epi TT sys.

Device Process

Electron-beam physical vapor deposition
Fig. 2-1. Electron Beam Evaporator
Model
TVS/10EB
Mrf.
takuma Co. Ltd.,
Features
Target
6 Round Revolver turret
Source
Ti, Al, Ni, Au, Pd, Pt
holder Dia.
Φ120 / Φ2" x 3
Heating
Cycled Silicone Oil
RF Sputter
Fig. 2-2. RF Rective Sputter
Model
SPF-210
Mrf.
ANELVA Corp.
Features
Geometry
Conventional, RF
RF Source
Max.50 W
Gas
Ar, N2, O2
ICP-RIE
Fig. 2-3. Reactive Ion Etching (ICP-RIE)
Mrf.
Samco Inc.
Model
RIE-101iHM
Option
Heater for In-compounds
Heat Sys.
Cyled Silicone Oil
RTA
Fig. 2-4. Rapid Thermal Anneal
Mrf.
ULVAC RIKO, Inc.
Range
200 - 1000°C

Lithography

Aligner
Fig. 3-1. Mask Aligner
Mrf.
Mikasa Co., Ltd.
Model
MA-10
wavelength
Broadband (g/h/i-line)
Max. Sub. Size
φ4"
Draft Chamber
Fig. 3-2. Draft Chamber
Draft Chamber
Stainless Steel with HEPA down flow system
Ressit Coater
Opticoat MS-A100, Mikasa Co., Ltd.
Resist Oven
Fig. 3-3. Resist Oven
Model
DKM300
Mrf.
Yamato Scientific co., ltd.
Stylus Profiler
Fig. 3-4. Stylus Profiler
Model
Alpha Step IQ
Mrf.
KLA Tencor Corporation
O<sub>2</sub> Asher
Fig. 3-5. O2 Asher
Model
PR500
Mrf.
Yamato Scientific co., ltd.
Water Purifier
Fig. 3-6. RO/DI water system
Model
TW-300RU (MINIPURE Series)
Mrf.
Nomura Micro Science Co., Ltd.

Assembly

dicing saw
Fig. 4-1. Dicing Saw
Model
DAD322
Mrf.
DISCO corp.
Blades
Vitrified Bond
GaN, SiC, Sapphire
Electroformed Bond
Si
Wire Bonder
Fig. 4-2. Ball Bonder
Model
4522
Mrf.
Kulicke and Soffa Industries, Inc.
Wafer Bonder
Fig. 4-3. Wafer Bonder
Model
????
Mrf.
Oshigane YK.

Characterization

Structure Evaluation

HR-XRD 4MC Ge022 asym.
Fig. 5-1. HR-XRD
Model
D8 Discover/M
Mrf.
Bruker AXS
Features
Source
Fixed Anode Tube
Collimator
Göbel Mirror
Monochromator
4-bounce Ge 022 Asym.
1D PSD
VANTEC-1
1D type
Mikrogap: Multi Proportional Counter
0D Detector
Scintillation Counter
AFM
Fig. 5-2. Atomic Force Microscope
Model
SPM-9600
Mrf.
SHIMADZU corp.
Option
PFM, KFM module

Optical Evaluation

PL-mapping
Fig. 5-3. Micro PL System
Fig. 5-4. Excitation Light Sources
  • Ti:sapphire SP Tsunami
  • Nd:YVO4 SP Millenia Pro 10W
  • He-Cd (325, 422 nm) KIMMON KOHA
Fig. 5-5. Vis-NIR Multi Channel Analyzer(MCA)
Mfr.
SOMA OPTICS, LTD.
Model
S1100
Range
300 - 1,000 nm
Detector
Si CCD
Fiber
FC Connector
Fig. 5-6. NIR MCA
Mfr.
SOMA OPTICS, LTD.
Model
S1600
Range
900 - 1,600 nm
Detector
InGaAs CCD
Fiber
FC Connector

Spectrophotometer

FT-IR
Fig. 5-7. Fourier Transformation Spectroscopy
Model
VERTEX 80V/M
Mrf.
Burker Optics
Features
Lamp
W, SiC Glober
Beam Splitter
CaF2, KBｒ, Mylar
Detector
InGaAs, DTGS, DLaTGS
Range
100 - 10,000 /cm
Giometory
Absorption, Reflection
Dispersive IR Spectroscopy
Fig. 5-8. Dispersive IR Spectroscopy
Model
UV-3600
Mrf.
SHIMADZU corp.
features
Lamp
Halogen(W), Deuteron
Monochromator
Grating
Detector
Photo-multiplier Tube, InGaAs, PbS
Range
UV - NIR (180 nm – 2.5 µm)
Giometory
Absorption, Reflection
Option
Model. MPG3100 with He Cryopump

Photoelectric Conversion

Manual Prober
Fig. 5-9. Manual Probe Station

Electrical Prober for Photoelectric Conversion

Solar Simulator
Fig. 5-10. Solar Simulator
Mrf.
Asahi Spectra Co., Ltd.
Model
HAL-320
spectrum
AM1.5G quasi solar

Electrical Evaluation

Hall Measurement
Fig. 5-11. Hall Measurement System
Current Source
KEITHLAY 6221
Voltmeter
KEITHLAY 2182A
Magnet
TAMAKAWA CO.,LTD